II. Product Features
(I) Ultra-precision geometric accuracy
Milling by five-axis linkage machining center, flatness error <0.005mm, positioning cavity coaxiality tolerance ±0.003mm, mounting hole position error <0.01mm, ensuring the optical path alignment accuracy after optical components are assembled, meeting the needs of nano-level optical detection and lithography equipment.
(II) High stability material
Aviation-grade aluminum alloy is heat-treated at T6, with a tensile strength of 310MPa and an elastic modulus of 70GPa. It is equipped with a hard anodized layer (thickness 15-20μm) and has excellent anti-deformation and anti-corrosion properties; the non-magnetic characteristics avoid interfering with the magnetic field environment of the optical system, ensuring the normal operation of equipment such as magneto-optical modulation and electron beam exposure.
(III) Low stress design

The structure is optimized through finite element analysis, the thickness gradient of the base and the layout of the ribs are reasonable, vibration aging is used to eliminate residual stress during processing (residual stress <50MPa), and the thermal deformation of the equipment during operation is <0.002mm/℃, which is suitable for high and low temperature optical experimental environments.

Features	Parameters
Processing accuracy	Flatness <0.005mm, coaxiality ±0.003mm
Material properties	Tensile strength 310MPa, elastic modulus 70GPa, non-magnetic
Stress control	Residual stress <50MPa, thermal deformation <0.002mm/℃

III. Product Details
In the production process, 6061-T6 aluminum alloy bars are selected, and after 12 processes such as sawing, rough milling, stress relief, fine milling, and anodizing, laser interferometers are used to detect flatness in each step, and three-coordinate measuring instruments are used to calibrate hole position accuracy.

The finished product is used in semiconductor lithography equipment, carrying the objective lens system to achieve nanometer-level graphic transfer; with a laser tracker, it is used as a reference seat to ensure the accuracy of spatial coordinate measurement; in astronomical telescopes, it stably supports the secondary mirror group and eliminates the optical path deviation caused by thermal expansion and contraction. From wafer manufacturing to deep space exploration, it has become the "invisible cornerstone" of optical precision equipment with ultra-precision, high stability, and low stress characteristics, making the path of each beam of light precisely controllable.